The advanced mask CD MTT control using dry etch process for sub 65 nm techSANG JIN JO; HO YONG JUNG; DONG WOOK LEE et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 673008.1-673008.8, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

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